Heat-developable light-sensitive material

Details Heat-developable light-sensitive material Heat-developable light-sensitive material

1985-08-22

1987-03-03

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Thermographic process

Heat applied after imaging

430351, 430570, 430617, 430619, 430620, 430955, 430151, 430171, 430543, 430559, 430562, G03C 102

Patent

active

046475265

ABSTRACT:
A heat-developable light-sensitive material is described which is capable of providing images of high density and low fog in a short period of time, and which is excellent in stability. The heat-developable light-sensitive material comprises a support and formed thereon a heat developable light-sensitive layer, wherein said light-sensitive material contains at least one compound selected from the group consisting of compounds represented by formulae (I), (II), (III) and (IV) as a base precursor ##STR1## wherein symbols represent the same groups as defined in claim 1.

REFERENCES:
patent: 3220846 (1965-11-01), Tinker et al.
patent: 4487826 (1984-12-01), Watanabe et al.
patent: 4514493 (1985-04-01), Hirai et al.

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