Healing pinhole defects in amorphous silicon films

Details Healing pinhole defects in amorphous silicon films Healing pinhole defects in amorphous silicon films

1982-05-28

1984-08-21

Lawrence, Evan K.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 541, 427 74, 427140, 4272551, B05D 306

Patent

active

044669925

ABSTRACT:
A method for healing physical defects in semiconductive films is described. A transparent substrate and semiconductive film are passed to a vacuum chamber in which the film layer is contacted with an activating vapor such as mercury and a depositing vapor such as silane while light is passed through the transparent substrate from the side opposite the film and into the vacuum chamber through any defects in the film. The light activates the mercury vapor and deposits silicon hydride in the defect areas, thus providing a physically healed semiconductive film.

REFERENCES:
patent: 4123989 (1978-11-01), Jewett
patent: 4181751 (1980-01-01), Hall et al.
patent: 4217374 (1980-08-01), Ovshinsky et al.

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