Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent
1998-03-12
2000-09-12
Tran, Hien
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
422171, 422177, 502 61, 502 64, 502 73, 502235, 502407, B01D 5334, B01J 2002
Patent
active
061174009
ABSTRACT:
An HC emission control member includes an HC adsorbing layer on a carrier and an HC oxidizing layer on the HC adsorbing layer. The hydrophobic property of the HC adsorbing layer is enhanced, so that satisfactory adsorption and desorption of HC could be obtained.
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patent: 5447694 (1995-09-01), Swaroop et al.
patent: 5525307 (1996-06-01), Yasaki et al.
patent: 5741948 (1998-04-01), Kirishiki et al.
Endo Tetsuo
Kikuchi Shin-ichi
Naka Takahiro
Shimizu Haruhiko
Wakabayashi Mitsuo
Honda Giken Kogyo Kabushiki Kaisha
Tran Hien
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