Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent
1998-03-09
2000-02-29
Tran, Hien
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
422169, 422171, 422182, 422228, 422210, 55413, 55427, 55436, 55439, 55446, 55465, B01D 5334, B01D 4508
Patent
active
060305843
ABSTRACT:
An apparatus defines a chamber into which hazardous gas is discharged. Disposed about the hazardous gas discharge flow are nozzles from which oxygen flows for mixing with the hazardous gas. A structure within the chamber receives the hazardous gas and oxygen and defines an area in which a reaction occurs therebetween. The structure includes perforate components which deter the formation of gas pockets and diminish the risk of explosion. The hazardous gas mixed with oxygen is subsequently directed toward baffles on which may be deposited matter precipitating from the combined oxygen and hazardous gas. Prior to discharge from the apparatus, the gas and oxygen mixture may be subjected to a filter for further removal of matter. Both hazardous gas and oxygen flows are induced through the apparatus by a source of reduced pressure.
REFERENCES:
patent: 5271908 (1993-12-01), Shiban et al.
patent: 5353829 (1994-10-01), Shiban
patent: 5662722 (1997-09-01), Shiban
patent: 5699826 (1997-12-01), Shiban
Givnan, Jr James D.
Innovative Engineering Solutions, Inc.
Tran Hien
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