Hardware/software implementation for multipass E-beam mask writi

Details Hardware/software implementation for multipass E-beam mask writi Hardware/software implementation for multipass E-beam mask writi

1996-04-26

1997-04-15

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 37304

Patent

active

056212160

ABSTRACT:
A process smooths the edges of rectangles written by an E-beam lithography system to improve critical dimension (CD) control in these shapes in the preparation of X-ray masks. The CD tolerances of X-ray masks are improved without the usual postprocessing costs normally associated with multipass solutions, thereby saving time and money when multipass writing is used in X-ray lithography. Two enhancements are provided to an X-ray mask maker that allow use of the same E-beam drive code for each exposure of a multipass write operation.

REFERENCES:
patent: 4477729 (1984-10-01), Chang et al.
patent: 4816692 (1989-03-01), Rudert, Jr.

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