Hardening of photoresist

Details Hardening of photoresist Hardening of photoresist

1983-05-23

1985-10-22

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415914, 430325, 430326, 430330, B32B 2716

Patent

active

045486883

ABSTRACT:
Photoresist is hardened by exposing it to UV radiation while subjecting it to elevated temperatures upon an increase in the degree of polymerization due to exposure to the radiation. The temperature of the photoresist can be controlled by a thermal chuck which contains a thermal ballast of heat conducting material.

REFERENCES:
patent: 3415648 (1968-12-01), Certa
patent: 3549366 (1970-12-01), Margerum
patent: 3623870 (1971-11-01), Curran et al.
patent: 4130426 (1978-12-01), Takeda et al.
patent: 4264712 (1981-04-01), Kress
patent: 4429034 (1984-01-01), Keane et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.

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