Hard surface cleaning composition

Compositions – Fluent dielectric – N-containing

Patent

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Details

252173, 25217417, 25217423, 25217424, 25217421, 252527, 252528, 252547, 252531, 252532, 252539, 252540, 252550, 252551, 252545, 252526, 252555, 252536, 252558, 252559, 252DIG2, 252DIG14, C11D 175, C11D 337

Patent

active

046907793

ABSTRACT:
An improved, substantially non-streaking, aqueous hard surface cleaning composition is disclosed comprising approximately 0.05% to 25.0% by weight of a surfactant selected from anionic, nonionic, amphoteric and cationic
onionic N-bearing surfactants of up to 30 carbon atoms; approximately 0.05% to 25.0% by weight of an unbranched, straight chain polymer of molecular weight less than 5,000; approximately; 0.05% to 25.0% by weight of an aqueous solvent of the general structure R-(CH.sub.2).sub.x OH where R is selected from the group consisting essentially of H, alkyl, aryl, aroxy or alkoxy, wherein X is an integer from 1 to 10; a builder; and the remainder as water.
The unbranched, straight chain polymers are preferably selected from the group consisting of polyethylene glycol, polyvinyl pyrrolidone, methyl hydroxy propyl cellulose, or polyacrylic acid.
Cleaning adjuncts selected from the group consisting of dyes, fragrances, pH adjusters, and antimicrobially active compounds may be added.

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