Compositions – Fluent dielectric – N-containing
Patent
1991-04-25
1993-10-19
Lewis, Michael
Compositions
Fluent dielectric
N-containing
C11D 112
Patent
active
052542904
ABSTRACT:
A cleaning composition is prepared including an anionic surfactant, a nonionic surfactant, a fatty acid, a water soluble organic solvent, a water insoluble organic solvent and sequestering agent of 2-hydroxy-3-aminopropionic-N,N-diacetic or its derivatives in the amount of about 2.0% to 8.0% by weight. The cleaning composition is particularly adapted for cleaning hard surfaces and is effective in degreasing and removing soap scum from kitchen and bathroom surfaces. The composition has a pH of about 8.5 to 12.5 and is particularly suited for acid sensitive surfaces.
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Technical Information Bulletin by BASF dated Oct. 1988 for Trilon ES 9910.
Blandiaux Genevieve
Loth Myriam
Massaux Jean
Hendrickson Stuart L.
Lewis Michael
Lieberman Bernard
Nanfeldt Richard E.
Sullivan Robert
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