Hard multilayer film formed material of titanium and carbon/sili

Details Hard multilayer film formed material of titanium and carbon/sili Hard multilayer film formed material of titanium and carbon/sili

1993-07-14

1997-09-02

Speer, Timothy

Stock material or miscellaneous articles

Composite

Of metal

428472, 428689, 428698, 428699, 4289088, B32B 900

Patent

active

056630000

ABSTRACT:
A hard multilayer film structure comprises a titanium-containing compound layer possessing high wear resistance deposited on a substrate and a silicon-containing hard carbon layer possessing self-lubricating properties, high wear resistance and high resistance to heat. Deposition of these layers is effected by the plasma-enhanced chemical vapor deposition technique. As a raw gas for the deposition of silicon-containing hard carbon layer, the gas containing tetramethyl silane or tetraethyl silane is used. Deposition of the silicon-containing hard carbon layer is carried out at a temperature of not more than 550.degree. C. and a pressure in the range of 0.05 to 0.5 Torr.

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