Hard mask structure for patterning of materials

Details Hard mask structure for patterning of materials Hard mask structure for patterning of materials

2008-04-08

2009-06-23

Ahmed, Shamim (Department: 1792)

Coating apparatus

Solid applicator contacting work

With work-handling or work-supporting

C216S041000, C216S047000

Reexamination Certificate

active

07550044

ABSTRACT:
Techniques for magnetic device fabrication are provided. In one aspect, a method of patterning at least one, e.g., nonvolatile, material comprises the following steps. A hard mask structure is formed on at least one surface of the material to be patterned. The hard mask structure is configured to have a base, proximate to the material, and a top opposite the base. The base has one or more lateral dimensions that are greater than one or more lateral dimensions of the top of the hard mask structure, such that at least one portion of the base extends out laterally a substantial distance beyond the top. The top of the hard mask structure is at a greater vertical distance from the material being etched than the base. The material is etched.

REFERENCES:
patent: 6323093 (2001-11-01), Xiang et al.
patent: 6613681 (2003-09-01), Hillyer et al.
patent: 6965138 (2005-11-01), Nakajima et al.
patent: 2004/0026364 (2004-02-01), Kihara et al.
patent: 2005/0067643 (2005-03-01), Zhuang et al.
patent: PCTUS2005044263 (2007-12-01), None

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