Hard mask composition and method for manufacturing...

Details Hard mask composition and method for manufacturing... Hard mask composition and method for manufacturing...

2006-06-02

2008-11-11

Gulakowski, Randy (Department: 1796)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From silicon reactant having at least one...

C524S588000, C430S270100

Reexamination Certificate

active

07449538

ABSTRACT:
Disclosed herein is a cross-linking polymer that includes a silicon compound and a hydroxyl compound. Also disclosed herein is a composition that includes the cross-linking polymer and an organic solvent. The composition can be used as a part of hard mask film applied over an underlying layer during the manufacture of a semiconductor device. The hard mask film is useful in the formation of a uniform pattern on the device.

REFERENCES:
patent: 2005/0031964 (2005-02-01), Babich et al.
patent: 2005/0042538 (2005-02-01), Babich et al.

Affiliated with

Also associated with

Rating

Hard mask composition and method for manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hard mask composition and method for manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hard mask composition and method for manufacturing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4029967