Hard films and sputtering targets for the deposition thereof

Details Hard films and sputtering targets for the deposition thereof Hard films and sputtering targets for the deposition thereof

2006-07-03

2009-06-02

Turner, Archene (Department: 1794)

Compositions: coating or plastic

Coating or plastic compositions

Aluminum compound containing

Reexamination Certificate

active

07540912

ABSTRACT:
For superior wear resistance to conventional TiN hard films and TiAlN hard films, a hard film contains (Zr1-a, Hfa) (C1-xNx), wherein “a” and “x” are the atomic ratios of Hf and N, respectively, and satisfy the following conditions: 0.05≦a≦0.4 and 0≦x≦1. Another hard film contains (Zr1-a-b, Hfa, Mb) (C1-xNx), wherein M is at least one of W and Me; and “a”, “b”, and “x” are the atomic ratios of Hf, M, and N, respectively, and satisfy the following conditions: 0≦1-a-b, 0≦a, 0.03≦b≦0.35, and 0≦x≦1.

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