Hard carbon thin film and method of forming the same

Stock material or miscellaneous articles – Self-sustaining carbon mass or layer with impregnant or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

428212, 428697, 428698, 428699, 428701, 428702, 427249, B32B 906, C23C 1600

Patent

active

060663995

ABSTRACT:
A hard carbon thin film formed on a substrate has a graded structure in which a ratio of sp.sup.2 to sp.sup.3 carbon-carbon bonding in the thin film decreases in its thickness direction from a thin film/substrate interface toward a surface of the thin film.

REFERENCES:
patent: 4647494 (1987-03-01), Meyerson et al.
patent: 4777090 (1988-10-01), Ovshinsky et al.
patent: 4877677 (1989-10-01), Hirochi et al.
patent: 5173089 (1992-12-01), Tanabe et al.
patent: 5237967 (1993-08-01), Willermet et al.
patent: 5368937 (1994-11-01), Itoh

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hard carbon thin film and method of forming the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hard carbon thin film and method of forming the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hard carbon thin film and method of forming the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1835598

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.