Hard and adherent layers from organic resin coatings

Details Hard and adherent layers from organic resin coatings Hard and adherent layers from organic resin coatings

1983-01-31

1983-10-18

Hoffman, James R.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

427 38, 428142, 428442, 430291, 430296, 430319, 430326, G03G 168, B05D 306

Patent

active

044106114

ABSTRACT:
A hard and adherent coating is formed from a sulfur-free organic resin coating by ion bombardment at an initial range, to at least partially carbonize the coating, and then at a lesser range, to enhance scratch resistance through improved adhesion.

REFERENCES:
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patent: 3989524 (1976-11-01), Palac
patent: 4018937 (1977-04-01), Levine
patent: 4068018 (1978-01-01), Hashimoto et al.
patent: 4078098 (1978-03-01), Cortellino
patent: 4087569 (1978-05-01), Hatzakis
patent: 4211834 (1980-07-01), Lapadula et al.
patent: 4321317 (1982-03-01), MacIver
Okuyama et al., "High Dose Ion Implantation into Photoresist", Journal of Electrochemical Society, vol. 125, pp. 1293-1298, Aug. 1978.
Oldham, "The Fabrication of Microelectronic Circuits", Scientific American, vol. 237, No. 3, pp. 111-114, 119-124, 126, 128, Sep. 1977.
Leboss, "Deep UV Option Promotes Fine Lines", Electronics, Sep. 13, 1979, pp. 44, 46.
Fujimori et al., "The Effect of Ion Bombardment on Carbon Films Prepared by Laser Evaporation", Japanese Journal of Applied Physics, vol. 20, No. 3, pp. L194-L196, Mar. 1981.

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