Halogenated polystyrenes for electron beam, X-ray and photo resi

Details Halogenated polystyrenes for electron beam, X-ray and photo resi Halogenated polystyrenes for electron beam, X-ray and photo resi

1984-10-19

1987-07-07

Michl, Paul R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526206, C08F 1402, C08F 1416

Patent

active

046788506

ABSTRACT:
Poly(halogenated styrene) compositions having a molecular weight range of from about 1.times.10.sup.5 to 1.times.10.sup.6 and a dispersivity of from about 1.5 to about 2.5 useful as negative resists.

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patent: 4061799 (1977-12-01), Brewer
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patent: 4262081 (1981-04-01), Bowden et al.
Billmeyer, J. Pol. Sci., Part C, No. 8, pp. 161-176 (1965).
Brault et al, Photopolymers Principals-Processes and Materials, SPE, Ellenville, N.Y., pp. 91-105 (1979).

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