Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1976-05-03
1979-01-16
Danison, Walter C.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
156332, 20415918, 20415919, 260859R, 260860, 260869, 260872, 260884, 260885, 428482, 428423, C08F 250, C08F 400
Patent
active
041348117
ABSTRACT:
A film-forming halogenated photopolymerizable composition, which comprises: a) 20 to 70% by weight of at least one halogenated polymer, which (1) has a chain interrupted by at least one oxygen or nitrogen atom, (2) contains from 4 to 70% by weight halogen atoms attached to carbon atoms having the electronic configuration sp.sup.2, (called active halogen atoms), (3) has an average molecular weight between 700 and 10,000, (4) has a glass transition temperature (Tg) between 20.degree. C and the thermal decomposition point of the polymer; b) 20 to 60% by weight of at least one monomeric organic compound containing at least two acrylic acid and/or methacrylic acid radicals and containing from 0 to 65% by weight of active halogen atoms; c) 0 to about 40% by weight of at least one monomeric organic compound containing an acrylic acid or methacrylic acid radical and containing from 0 to about 65% by weight active halogen atoms; d) about 1 to about 25% by weight of a photoinitiator system comprising 1) 0.5 to 100% by weight of at least one aromatic ketone, 2) 0 to 99.5% by weight of at least one tertiary amine, at least one carbon atom of which, in the alpha position with regard to the nitrogen atom, carries at least one hydrogen atom; 3) 0 to 90% by weight of an aromatic or non-aromatic alpha-dione, the sum of 1) + 2) + 3) representing 100% by weight of the photoinitiator system; and the total content of active halogen atoms representing about 3 to about 50% by weight of the total halogenated photopolymerizable composition and printing inks, paints and varnishes based on said halogenated photopolymerizable composition, particularly suitable, inter alia, for the manufacture of printed circuits.
REFERENCES:
patent: 3389192 (1968-06-01), Ziegler
patent: 3507933 (1970-04-01), Larsen et al.
patent: 3536782 (1970-10-01), Toggweiler et al.
patent: 3577480 (1971-05-01), Thorpe
patent: 3677920 (1972-07-01), Kai et al.
patent: 3699022 (1972-10-01), Behrens et al.
patent: 3754054 (1973-08-01), Kimura et al.
patent: 3759807 (1973-09-01), Osborn et al.
patent: 3794494 (1974-02-01), Kai et al.
patent: 3839171 (1974-10-01), Akamatsu et al.
patent: 3847771 (1974-11-01), McGinniss
patent: 3992276 (1976-11-01), Powander et al.
Colpaert Marc
De Poortere Michel
Dufour Paul
Vrancken August
Danison Walter C.
UCB Societe Anonyme
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