Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1991-10-11
1993-05-25
Garvin, Patrick P.
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 41, 252142, C23G 102
Patent
active
052136213
ABSTRACT:
This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of a partially halogenated or fully halogenated linear or branched carboxylic acid having from 2 to about 10 carbon atoms wherein the halogen is selected from fluorine or chlorine. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
REFERENCES:
patent: 5051134 (1991-09-01), Schnegg et al.
patent: 5106454 (1992-04-01), Allardyee et al.
Bohling David A.
Ivankovits John C.
Roberts David A.
Air Products and Chemicals Inc.
Garvin Patrick P.
Gourley Keith D.
Marsh William F.
Simmons James C.
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