Halogen-assisted chemical vapor deposition of diamond

Details Halogen-assisted chemical vapor deposition of diamond Halogen-assisted chemical vapor deposition of diamond

1991-05-07

1994-05-31

King, Roy

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

4272551, 427122, 427314, 423446, 428408, C23C 1600

Patent

active

053167953

ABSTRACT:
The present invention is directed to a method for depositing diamond films and particles on a variety of substrates by flowing a gas or gas mixture capable of supplying (1) carbon, (2) hydrogen, (3) a halogen and, preferably, (4) a chalcogen through a reactor over the substrate material. The reactant gases may be premixed with an inert gas in order to keep the overall gas mixture composition low in volume percent of carbon and rich in hydrogen. Pre-treatment of the reactant gases to a high energy state is not required as it is in most prior art processes for chemical vapor deposition of diamond. Since pretreatment is not required, the process may be applied to substrates of virtually any desired size, shape or configuration.

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