Halogen additives for alkaline copper use for plating zinc die c

Electrolysis: processes – compositions used therein – and methods – Electrolytic coating – Depositing predominantly single metal coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

205296, 205239, 106 126, C25D 338

Patent

active

060540370

ABSTRACT:
A method and electrolyte bath for depositing Cu.sup.+1 ions from the cathode diffusion layer onto a zinc substrate. Halogen ions are used as additives to organophosphonate alkaline copper electrolytes for stabilizing Cu.sup.+1 in the cathode diffusion layer.

REFERENCES:
patent: 3928147 (1975-12-01), Kowalski
patent: 4462874 (1984-07-01), Tomaszewski et al.
patent: 4469569 (1984-09-01), Tomaszewski et al.
patent: 4521282 (1985-06-01), Tremmel
patent: 4933051 (1990-06-01), Kline
patent: 5421985 (1995-06-01), Clouser et al.
patent: 5607570 (1997-03-01), Rohbani
patent: 5750018 (1998-05-01), Brasch
Interzinc, Zinc Casting, A Systems Approach, Eastern Alloys, Inc., pp. 6-7. "Comparison of Typical Casting Alloy Properties" (table). No date available.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Halogen additives for alkaline copper use for plating zinc die c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Halogen additives for alkaline copper use for plating zinc die c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halogen additives for alkaline copper use for plating zinc die c will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-990754

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.