Halogen-activated chemical vapor deposition of diamond

Details Halogen-activated chemical vapor deposition of diamond Halogen-activated chemical vapor deposition of diamond

1995-04-04

1996-12-31

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427562, 427249, 427122, B05D 306, B05D 314, C23C 1626

Patent

active

055892310

ABSTRACT:
The present invention is directed to a method of producing diamond films through the thermal dissociation of molecular chlorine into atomic chlorine in a heated graphite heat exchanger at temperatures of from about 1,100.degree. C. to about 1,800.degree. C. The atomic chlorine is subsequently rapidly mixed with molecular hydrogen and carbon-containing species downstream. Atomic hydrogen and the carbon precursors are produced through rapid hydrogen abstraction reactions of atomic chlorine with molecular hydrogen and hydrocarbons at the point where they mix. The mixed gases then flow across a heated substrate, where diamond is deposited as a film. Diamond deposits have been confirmed by Raman spectroscopy.

REFERENCES:
patent: 5071677 (1991-10-01), Patterson et al.
patent: 5316795 (1994-05-01), Patterson et al.

Affiliated with

Also associated with

Rating

Halogen-activated chemical vapor deposition of diamond does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Halogen-activated chemical vapor deposition of diamond, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halogen-activated chemical vapor deposition of diamond will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1140487