Halo-zeo-type materials

Chemistry of inorganic compounds – Halogen or compound thereof – Plural metal or metal and ammonium containing

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423470, 423472, C01G 305, C01G 904

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active

058855424

ABSTRACT:
Disclosed herein is a novel class of halide-based framework solids based on a Zn.sub.n Cl.sub.2n parentage, as zeo-types are related to Si.sub.n O.sub.2n. These materials, referred to as halo zeo-type materials, constructed from Lewis acidic and redox active tetrahedral building blocks, should augment the size and shape selectivity characteristics of zeolites. One example of these materials, compound CZX-1, has the formula CH.sub.3).sub.2 !CuZn.sub.5 Cl.sub.12. Compound CZX-3 has the formula Rb.sup.+. The invention also relates to colloidal suspensions which may utilize the halide-based compounds.

REFERENCES:
patent: 3440296 (1969-04-01), Walker
patent: 3702828 (1972-11-01), Hoffman et al.
patent: 3766080 (1973-10-01), Swinehart et al.
patent: 3922331 (1975-11-01), MacDonald et al.
patent: 3947556 (1976-03-01), Jones et al.
patent: 3947557 (1976-03-01), Jones et al.
patent: 4099984 (1978-07-01), Christenson et al.
patent: 4100183 (1978-07-01), Christenson et al.
patent: 4102802 (1978-07-01), Johnson et al.
patent: 4111991 (1978-09-01), Garrison
patent: 4129519 (1978-12-01), Matsuzawa
patent: 4141960 (1979-02-01), Long et al.
patent: 4997597 (1991-03-01), Clough et al.
patent: 5100587 (1992-03-01), Clough et al.
patent: 5385716 (1995-01-01), Bogdanovic et al.

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