Hall ion generator for working surfaces with a low energy high i

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

156643, 156646, 204164, 204192E, 204298, 3133611, 3133621, 31511181, 31511191, C23C 1500

Patent

active

045418900

ABSTRACT:
Apparatus and method for generating low energy, high intensity ion beams. A Hall current ion source is provided to conduct many integrated circuit fabrication processes which require low energy ion bombardment such as surface cleaning. Ion sources are provided which have tapered magnetic pole pieces for controlling the dispersion pattern of the ion beam.

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