Hall effect sensor

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Magnetic field

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257 14, 257 15, 257190, 257421, 257426, 324260, 324252, 338 32H, H01L 2722, H01L 4300

Patent

active

054422213

ABSTRACT:
A Hall effect sensor of two-dimensional electron gas type comprising, on an insulating substrate, a quantum well structure, a carrier injection layer adjacent to the quantum well structure, of thickness less than 250 .ANG. and having an density per unit area of donors integrated over the whole thickness of the carrier injection layer less than 5.times.10.sup.12 cm.sup.-2, an insulating burial layer deposited on the carrier injection layer, having a conduction band with an energy level greater than the Fermi energy of the sensor and a thickness greater than 200 .ANG.. Applicable to the field of electricity meters and current sensors.

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Lau et al., "Low-Resistance Non-Spiking Ohmic Contact for AlGaAs/GaAs High Electron Mobility Transistors Using the Ge/Pcl Scheme," Applied Physics Letters, 54, Jun. 26, 1989 pp. 2677-2679.
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Patent Abstract of Japan, vol. 12, No. 273, Jul. 29, 1988, JP-A-63054785 (Agency of Ind. Science & Technology, Mar. 9, 1988.
Patent Abstract of Japan vol. 11, No. 294 (E-544) Sep. 22, 1987 JP-A-52-093-989 (Hatachi Ltd.) Apr. 30, 1987.

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