Halide anions for metal removal rate control

Details Halide anions for metal removal rate control Halide anions for metal removal rate control

2006-03-23

2010-10-26

Ahmed, Shamim (Department: 1713)

Compositions

Etching or brightening compositions

C051S307000, C106S003000

Reexamination Certificate

active

07820067

ABSTRACT:
The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, an oxidizing agent, and a halogen anion. The inventive method comprises chemically-mechanically polishing a substrate with the polishing system.

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