Halftone type phase shift mask blank and phase shift mask...

Details Halftone type phase shift mask blank and phase shift mask... Halftone type phase shift mask blank and phase shift mask...

2007-01-30

2007-01-30

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10370713

ABSTRACT:
A halftone type phase shift mask blank including, on a transparent substrate, at least a phase shifter film having a predetermined transmittance for an exposed light and a predetermined phase difference for the transparent substrate, wherein the phase shifter film is formed by a multilayer film in which films including at least two layers having an upper layer formed on the most surface side and a lower layer formed thereunder are provided, and a thickness of the upper layer is adjusted in such a manner that a refractive index of the film to be the upper layer is smaller than that of the film to be the lower layer and a surface reflectance for the inspecting light of the phase shifter film is maximized and approximates to a maximum.

REFERENCES:
patent: 5362591 (1994-11-01), Imai et al.
patent: 5409789 (1995-04-01), Ito
patent: 5935735 (1999-08-01), Okubo et al.
patent: 7-168343 (1995-07-01), None
patent: 2001-174973 (2001-06-01), None

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