Halftone type phase shift mask blank and halftone type phase...

Details Halftone type phase shift mask blank and halftone type phase... Halftone type phase shift mask blank and halftone type phase...

2007-01-23

2007-01-23

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10375063

ABSTRACT:
A halftone type phase shift mask having a semitranslucent film pattern and a shielding film pattern provided on a transparent substrate in this order is constituted in such a manner that each of the reflectances of the transparent substrate, the semitranslucent film pattern and the shielding film pattern for an inspecting light represents a difference which can detect the semitranslucent film pattern and the shielding film pattern based on a reflected light generated when the inspecting light is irradiated on the mask.

REFERENCES:
patent: 5882827 (1999-03-01), Nakao
patent: 6087047 (2000-07-01), Mitsui et al.
patent: 4-136854 (1992-05-01), None
patent: 6/282063 (1994-10-01), None
patent: 7-128840 (1995-05-01), None
patent: 2983020 (1999-09-01), None

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