Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,...
Patent
1979-08-27
1981-07-14
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Effecting frontal radiation modification during exposure,...
430 6, 430 7, 430 22, 350322, G03F 500
Patent
active
042787556
ABSTRACT:
An improved halftone dot screen for use in reproduction of continuous-tone graphic images is disclosed. The screen comprises a two-dimensional matrix of cells (dots) each cell having a common pattern of transmittance to radiation utilized in the reproduction process. The common pattern of transmittance for each cell is characterized by a finite number of different discrete transmittance level patterns. In a preferred embodiment, these patterns include portions arranged along the respective sides of a parallelogram. In one preferred embodiment, the discrete transmittance level patterns comprise an array of concentric parallelograms. Each parallelogram has a plurality of dot portions arranged along the sides of the parallelogram. The sides of the parallelogram patterns are preferably disposed at a substantial angle to the horizontal to reduce moire and rosette pattern effects and to simplify the reproduction process.
REFERENCES:
patent: 1370885 (1921-03-01), Frederick et al.
patent: 2183204 (1939-12-01), Reynolds
patent: 2292313 (1942-08-01), Yule
patent: 2719790 (1955-10-01), Monroy
patent: 3565527 (1971-02-01), Crespi
patent: 3737321 (1973-06-01), Torr et al.
patent: 3746540 (1973-07-01), Rarey
patent: 3814608 (1974-06-01), Middlemiss
Aine Harry E.
Kimlin Edward C.
Lowhurst Harvey G.
Lumin Inc.
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