Halftone phase shift photomask and blank for halftone phase...

Details Halftone phase shift photomask and blank for halftone phase... Halftone phase shift photomask and blank for halftone phase...

2005-03-22

2005-03-22

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06869736

ABSTRACT:
Disclosed is a blank for a halftone phase shift photomask comprising a transparent substrate and a halftone phase shift layer formed thereon, the halftone phase shift layer being provided with a layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen and being formed of a multilayer film with two or more layers, wherein the multilayer film contains a layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy and the layer whose major component is either one of chromium and tantalum or a chromium tantalum alloy is laminated on the side closer to the transparent substrate than the layer containing molybdenum silicide as its major component and either one or both of oxygen and nitrogen.

REFERENCES:
patent: 5482799 (1996-01-01), Isao et al.
patent: 5536603 (1996-07-01), Tsuchiya et al.
patent: 6599667 (2003-07-01), Yusa et al.
patent: 06-110193 (1994-04-01), None
patent: 08-076353 (1996-03-01), None
patent: 08-123010 (1996-05-01), None

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