Halftone phase shift mask blanks, halftone phase shift masks, an

Details Halftone phase shift mask blanks, halftone phase shift masks, an Halftone phase shift mask blanks, halftone phase shift masks, an

1998-12-22

2000-03-14

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060370831

ABSTRACT:
An object is to provide acid-resistant, highly reliable phase shift masks, and phase shift mask blanks, wherewith high-precision patterning is possible.
A halftone phase shift mask blank comprising a transparent substrate 10, a halftone material film 11 laminated on that transparent substrate, and a metal film 12 laminated on that halftone material film, wherein the metal film is formed by a plurality of metal films having different etching rates, and the etching rate for the metal film positioned on the transparent substrate side is set so that it is faster, either in stages or continuously, than the etching rate of the metal film positioned on the surface side.

REFERENCES:
patent: 4696877 (1987-09-01), Matsui et al.
patent: 5272024 (1993-12-01), Lin

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