Halftone phase shift mask blank, and method of manufacture

Details Halftone phase shift mask blank, and method of manufacture Halftone phase shift mask blank, and method of manufacture

2006-12-20

2009-11-24

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07622228

ABSTRACT:
A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.

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