Stock material or miscellaneous articles – Composite – Of inorganic material
A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.
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Yoshioka et al., “An attentuated phase-shifting mask with a single-layer absorptive shifter”, Mitsubishi Denki Giho, 1995, Japan, vol. 69, No. 3, pp. 67-71 (XP008030088).
Birch & Stewart Kolasch & Birch, LLP
Ivey Elizabeth D.
McNeil Jennifer C.
Shin-Etsu Chemical Co. , Ltd.
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