Halftone phase-shift mask blank and halftone phase-shift mask

Details Halftone phase-shift mask blank and halftone phase-shift mask Halftone phase-shift mask blank and halftone phase-shift mask

2006-06-13

2006-06-13

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07060394

ABSTRACT:
A halftone phase-shift mask blank, in which the phase shifter film is composed of two layers, a low-transmission layer having a principal function of transmittance control, and a high-transmission layer having a principal function of phase shift control, the extinction coefficient K1of the low-transmission layer and the extinction coefficient K2of the high-transmission layer satisfy K2<K1≦3.0 at an exposure wavelength λ falling between 140 nm and 200 nm, and the thickness d1of the low-transmission layer satisfies 0.001≦K1d1/λ≦0.500 at the exposure wavelength λ.

REFERENCES:
patent: 5897977 (1999-04-01), Carcia et al.
patent: 5939227 (1999-08-01), Smith
patent: 7-199447 (1995-08-01), None
patent: 8-211591 (1996-08-01), None
patent: 2000-511301 (2000-08-01), None

Affiliated with

Also associated with

Rating

Halftone phase-shift mask blank and halftone phase-shift mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Halftone phase-shift mask blank and halftone phase-shift mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Halftone phase-shift mask blank and halftone phase-shift mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3614883