Halftone phase-shift mask and halftone phase-shift mask defect c

Details Halftone phase-shift mask and halftone phase-shift mask defect c Halftone phase-shift mask and halftone phase-shift mask defect c

1997-12-29

1999-08-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059452374

ABSTRACT:
In a halftone phase-shift mask, a phase-inverting light transmission part is formed inside the light-blocking part which blocks light that is radiated onto a transparent substrate so as to cover a shifter missing part defect, this phase-inverting light transmission part inverting the phase of light that passes through it with respect to light that passes through a light transmission part. The ratio between the surface areas of the phase-inverting light transmission part and the light-blocking part is established so that the transfer characteristics of the light-blocking part during exposure are substantially the same as those of the translucent phase-shift part.

REFERENCES:
patent: 5593801 (1997-01-01), Yoshioka et al.

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