Half tone alternating phase shift masks

Details Half tone alternating phase shift masks Half tone alternating phase shift masks

2006-03-21

2006-03-21

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

07014962

ABSTRACT:
A structure, a method of fabricating and a method of using a phase shift mask (PSM) having a first phase shifted section, a half tone section, and a second phase shifted section. The first phase shift section and the half tone section are shifted 180 degrees with the second phase shift region. Embodiments provide for (1) a half tone, single trench alternating phase shift mask and (2) a half tone, dual trench alternating phase shift mask. The half tone region provides advantages over conventional alternating phase shift masks.

REFERENCES:
patent: 5766829 (1998-06-01), Cathey, Jr. et al.
patent: 6355399 (2002-03-01), Sajan et al.
patent: 6410191 (2002-06-01), Nistler et al.
patent: 6458495 (2002-10-01), Tsai et al.
patent: 6482554 (2002-11-01), Matsunuma
patent: 2004/0018436 (2004-01-01), Ishikawa
S. Vaidya, Phase-Shifting Photomasks, Semiconductor fabtech, Edition 1, Issued Sep. 1994, S. Vaidya, AT&T Bell Laboratories, Murray Hill, New Jersey, USA, Website: http://www.semiconductorfabtech.com/features/lithography/articles/body1.171.php3 , May 7, 2003.
John S. Petersen, et al., Development of a Sub-100nm Integrated Imaging System Using Chromeless Phase-Shifting Imaging with Very High NA KrF Exposure and Off-axis Illumination, found on website; http://www.advlitho.com/content/Papers/SPIE—microlith—02/4691-50—Petersen—Conley—et—al.pdf, May. 8, 2003 , discusses Chromeless Phase shift mask techniques.
Gerold, et al., Multiple Pitch Transmission and Phase Analysis of Six Types of Strong Phase-Shifting Masks, This material was presented at SPIE's 26th Annual International Symposium on Microlithography as presentation No. 4346-72 , found on website: http://www.advlitho.com/content/Papers/4346-72paper.pdf May 8, 2003. This reference discusses alternating phase shift masks.
Armen Kroyan and Hua-yu Liu, Effects of altPSM Design on Image Imbalance for 65 nm, Semiconductor International, Feb. 1, 2003 http://www.e-insite.net/semiconductor/index.asp?layout=article&articleId=CA273367&spacedesc=webex).

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