Half mirror film producing method and optical element...

Electric lamp and discharge devices: systems – Plural power supplies – Plural cathode and/or anode load device

Reexamination Certificate

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C315S169300, C359S016000

Reexamination Certificate

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06903512

ABSTRACT:
A method of producing a half mirror film on a substrate having a light transmissive property, comprising steps of: electrically discharging between electrodes facing each other under an atmospheric pressure or an approximate atmospheric pressure so as to make an reactive gas on a plasma state; and exposing a substrate to the reactive gas on the plasma state so as to form a half mirror film on the substrate.

REFERENCES:
patent: 4891305 (1990-01-01), Oba et al.
patent: 5219707 (1993-06-01), Namba
patent: 5272554 (1993-12-01), Ji et al.
patent: 5343115 (1994-08-01), Anandan et al.
patent: 5537666 (1996-07-01), Mori et al.
patent: 5587335 (1996-12-01), Mori et al.
patent: 5621832 (1997-04-01), Yokoyama et al.
patent: 5682402 (1997-10-01), Nakayama et al.
patent: 6219188 (2001-04-01), Tsukamoto
patent: 6479942 (2002-11-01), Kimura
patent: 1 342 810 (2003-09-01), None
patent: WO 02/48428 (2002-06-01), None
Patent Abstracts of Japan, vol. 200, No. 14, Mar. 5, 2001 of JP 2000 309871 A (Sekisui Chem. Co. Ltd.) Nov. 7, 2000.
Gherardi et al., “A new approach to SiO2deposit using a N2-SiH4-N2O glow dielectric barrier-controlled discharge at atomospheric pressure”, Journal of Physics D (Applied Physics), Oct. 7, 2000, IOP Publishing Ltd., UK, vol. 33, No. 19, pp. L104-L108, XP002261784; ISN: 0022-3727.
Patent Abstracts of Japan, vol. 008, No. 257 (P-316) Nov. 24, 1984 of JP 59 127001 A (Toyota Motor Corp.), Jul. 21, 1984.

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