Guideless stage with isolated reaction frame

Details Guideless stage with isolated reaction frame Guideless stage with isolated reaction frame

1996-06-20

1998-04-28

Sircus, Brian

Electricity: motive power systems

Positional servo systems

Program- or pattern-controlled systems

318 38, 7447901, 378 34, G03B 4116

Patent

active

057449244

ABSTRACT:
A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween. The linear positioning forces of the actuator drive means are mounted and controlled so that the vector sum of the moments of force at the center of gravity of the object stage due to the positioning forces of the drive means is substantially equal to zero. The actuator mounting means can include at least two thin flexible members mounted in series with the primary direction of flex of the members being orthogonal to one another.

REFERENCES:
patent: Re27289 (1972-02-01), Sawyer
patent: Re27436 (1972-07-01), Sawyer
patent: 3789285 (1974-01-01), Nishizawa
patent: 3889164 (1975-06-01), Nishizawa et al.
patent: 3935486 (1976-01-01), Nagashima
patent: 4019109 (1977-04-01), McCoy et al.
patent: 4087729 (1978-05-01), Yamazaki et al.
patent: 4129291 (1978-12-01), Kato et al.
patent: 4234175 (1980-11-01), Imahashi et al.
patent: 4392642 (1983-07-01), Chitayat
patent: 4409860 (1983-10-01), Moriyama et al.
patent: 4425508 (1984-01-01), Lewis, Jr. et al.
patent: 4443743 (1984-04-01), Forys et al.
patent: 4485339 (1984-11-01), Trost
patent: 4492356 (1985-01-01), Taniguchi et al.
patent: 4504144 (1985-03-01), Trost
patent: 4506204 (1985-03-01), Galburt
patent: 4506205 (1985-03-01), Trost et al.
patent: 4507597 (1985-03-01), Trost
patent: 4514858 (1985-04-01), Novak
patent: 4516253 (1985-05-01), Novak
patent: 4525659 (1985-06-01), Imahashi et al.
patent: 4575942 (1986-03-01), Moriyama
patent: 4615515 (1986-10-01), Suzuta et al.
patent: 4628238 (1986-12-01), Smulders et al.
patent: 4630942 (1986-12-01), Tsumaki et al.
patent: 4641071 (1987-02-01), Tazawa et al.
patent: 4648723 (1987-03-01), Sugiyama et al.
patent: 4648724 (1987-03-01), Sugiyama et al.
patent: 4653408 (1987-03-01), Nagashima et al.
patent: 4654571 (1987-03-01), Hinds
patent: 4667139 (1987-05-01), Hirai et al.
patent: 4675891 (1987-06-01), Plessis et al.
patent: 4677651 (1987-06-01), Hartl et al.
patent: 4684315 (1987-08-01), Sugishima et al.
patent: 4687980 (1987-08-01), Phillips et al.
patent: 4698575 (1987-10-01), Bouwer
patent: 4708465 (1987-11-01), Isohata et al.
patent: 4723086 (1988-02-01), Leibovich et al.
patent: 4742286 (1988-05-01), Phillips
patent: 4744675 (1988-05-01), Sakino et al.
patent: 4750721 (1988-06-01), Sasada
patent: 4770531 (1988-09-01), Tanaka et al.
patent: 4812725 (1989-03-01), Chitayat
patent: 4817930 (1989-04-01), Deuren
patent: 4870668 (1989-09-01), Frankel et al.
patent: 4887804 (1989-12-01), Ohtsuka
patent: 4916340 (1990-04-01), Negishi
patent: 4952858 (1990-08-01), Galburt
patent: 5022619 (1991-06-01), Mamada
patent: 5040431 (1991-08-01), Sakino et al.
patent: 5059090 (1991-10-01), Bobroff et al.
patent: 5073912 (1991-12-01), Kobayashi et al.
patent: 5120034 (1992-06-01), Engelen et al.
patent: 5150153 (1992-09-01), Franken et al.
patent: 5228358 (1993-07-01), Sakino et al.
patent: 5241183 (1993-08-01), Kanai et al.
patent: 5243491 (1993-09-01), Eijk et al.
patent: 5280677 (1994-01-01), Kubo et al.
patent: 5285142 (1994-02-01), Galburt et al.
patent: 5309847 (1994-05-01), Matsumoto
patent: 5323712 (1994-06-01), Kikuiri
patent: 5327060 (1994-07-01), Engelen et al.
patent: 5385217 (1995-01-01), Watanabe et al.
patent: 5400674 (1995-03-01), Arnone et al.
patent: 5467720 (1995-11-01), Korenaga et al.
patent: 5471802 (1995-12-01), Yano et al.
patent: 5508518 (1996-04-01), Kendall
patent: 5524502 (1996-06-01), Osanai
patent: 5528118 (1996-06-01), Lee
patent: 5623853 (1997-04-01), Novak et al.

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