Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-03-08
1998-08-18
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
G03F 900
Patent
active
057956820
ABSTRACT:
Disclosed is an attenuated phase shift reticle design having a compensating transmissive region located where side lobe ringing is anticipated to be most severe. Unlike other transmissive regions on the reticle, no integrated circuit features are defined at the location of the compensating transmissive region. Because the radiation giving rise to side lobe ringing is approximately 180.degree. out of phase with the radiation passing through transmissive regions, radiation passing through the compensating transmissive region will reduce side lobe intensity by destructively interfering with the out of phase radiation. A disclosed reticle defines a plurality of closely packed vias to be formed in a passivating layer. In the case of a positive resist, transmissive regions are provided at locations on the reticle design corresponding to positions of the vias on the passivating layer. A phase shift reticle having such via layout is expected to produce severe side lobe ringing in the regions surrounding the vias. Thus, a compensating transmissive region is placed around each of the via transmissive regions in the manner of a halo.
REFERENCES:
patent: 5487963 (1996-01-01), Sugawara
patent: 5546225 (1996-08-01), Shiraishi
patent: 5591550 (1997-01-01), Choi et al.
Chang-Nam Ahn, Ki-Ho Baik, Yong-Suk Lee, Hung-Eil Kim, Ik-Boum Hur, Young-Sik Kim, Ju-Hwan Kim, and Soo-Han Choi, "A Study of Optical Proximity Effects Using Off-axis Illumination with Attenuated Phase Shift Mask," Hyundai Electronics Industries Co., Ltd., Korea; SPIE vol. 2440, pp. 222-226, Feb. 1995.
Nandasiri Samarakone, Wayne Chang, Erik Tandberg, Christina Elliott, Timothy Wang, "Comparative Study of I-line DUV Lithography for 0.35 .mu.m and Beyond," Northern Telecom Limited, Canada; SPIE vol. 2440, pp. 61-74, Feb. 1995.
Ik-Boum Hur, Ju-Hwan Kim, Il-Ho Lee, Hung-Eil Kim, Chang-Nam Ahn, Ki-Ho Baik, and Soo-Han Choi, "Effect of Pattern Density for Contact Windows in an Attenuated Phase Shift Mask," Hyundai Electronics Co., Ltd., Korea; SPIE vol. 2440, pp. 278-289, Feb. 1995.
Yong K. Choi, Young J. Song, Hong S. Kim, Woo S. Kim, "Optical Proximity Correction on Attenuated Phase Shifting Photo Mask for Dense Contact Array," Advanced Process Technology Dept., LG Semicon Co. 50, Korea; SPIE vol. 2440, pp. 328-332, Feb. 1995.
LSI Logic Corporation
Rosasco S.
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