Guard ring for TGZM processing

Details Guard ring for TGZM processing Guard ring for TGZM processing

1978-12-07

1980-11-18

Kaplan, Morris

Coating apparatus

Work holders, or handling devices

C23C 1100

Patent

active

042339340

ABSTRACT:
A guard ring for processing a wafer of semiconductor material by thermal gradient zone melting has a beveled internal wall surface for supporting the wafer therein. The thickness of the guard ring is about twice the thickness of the wafer.

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