Growth of textured gallium nitride thin films and nanowires...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Reexamination Certificate

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C117S088000, C117S089000, C117S095000, C117S952000

Reexamination Certificate

active

07819974

ABSTRACT:
A synthesis route to grow textured thin film of gallium nitride on amorphous quartz substrates and on single crystalline substrates such as c-sapphire and polycrystalline substrates such as pyrolytic boron nitride (PBN), alumina and quartz using the dissolution of atomic nitrogen rather than molecular nitrogen to allow for growth at subatmospheric pressure.

REFERENCES:
patent: 7238232 (2007-07-01), Sunkara et al.
patent: 2003/0039602 (2003-02-01), Sharma et al.
patent: 2004/0003495 (2004-01-01), Xu

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