Growth of in-situ thin films by reactive evaporation

Details Growth of in-situ thin films by reactive evaporation Growth of in-situ thin films by reactive evaporation

2003-12-01

2008-10-21

Silverman, Stanley (Department: 1793)

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Coating

C505S475000, C505S476000, C427S062000, C427S126100, C427S294000, C427S537000, C427S561000, C427S593000, C204S192240, C118S719000, C438S758000, C029S599000

Reexamination Certificate

active

07439208

ABSTRACT:
A method of forming MgB2films in-situ on a substrate includes the steps of (a) depositing boron onto a surface of the substrate in a deposition zone; (b) moving the substrate into a reaction zone containing pressurized, gaseous magnesium; (c) moving the substrate back into the deposition zone; and (d) repeating steps (a)-(c). In a preferred embodiment of the invention, the substrate is moved into and out of the deposition zone and the reaction zone using a rotatable platen.

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