Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
Patent
1996-02-05
1998-02-17
Garrett, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
117 89, 117 93, 117102, C30B 2936
Patent
active
057187606
ABSTRACT:
Large single crystals of silicon carbide are grown in a furnace sublimation system. The crystals are grown with compensating levels of p-type and n-type dopants (i.e., roughly equal to levels of the two dopants) in order to produce a crystal that is essentially colorless. The crystal may be cut and fashioned into synthetic gemstones having extraordinary toughness and hardness, and a brilliance meeting or exceeding that of diamond.
REFERENCES:
patent: 4966860 (1990-10-01), Suzuki et al.
patent: 5030580 (1991-07-01), Furukawa et al.
patent: 5433167 (1995-07-01), Furukawa et al.
Introduction to Ceramics, W. D. Kingery et al., Second Edition, John Wiley & Sons, pp. 676-679.
Optical and Electronic Properties of SiC, W. H. Choyke, The Physics and Chemistry of Carbides, Nitrides and Borides, Manchester, England, Sep. 1989, pp. 1-25.
Carter Calvin H.
Glass Robert C.
Tsvetkov Valeri F.
Cree Research Inc.
Garrett Felisa
Summa, Patent Attorney Philip
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