Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
Patent
1998-10-09
2000-07-11
Utech, Benjamin L.
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
117 87, 117 88, 117950, 117951, 117952, C30B 2500
Patent
active
060866721
ABSTRACT:
Bulk, low impurity aluminum nitride:silicon carbide (AlN:SiC) alloy single crystals are grown by deposition of vapor species containing Al, Si, N and C on a crystal growth interface.
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Champagne Donald L.
Cree Inc.
Faust Richard S.
Utech Benjamin L.
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