Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Patent
1999-07-27
2000-05-23
Hiteshew, Felisa
Single-crystal, oriented-crystal, and epitaxy growth processes;
Apparatus
117201, 117202, 117950, 117952, C30B 3500
Patent
active
060662050
ABSTRACT:
Large diameter single crystals of aluminum nitride (AlN) are grown isotropically by injecting a nitrogen-containing gas into liquid aluminum at elevated temperatures. A seed crystal that is maintained at a temperature below that of the surrounding liquid aluminum is pulled from the melt, while the AlN that is formed in the melt is deposited on the seed crystal. An apparatus for carrying out the method is also disclosed.
REFERENCES:
patent: 5858086 (1999-01-01), Hunter
patent: 5972109 (1999-10-01), Hunter
Cree Inc.
Faust Richard S.
Hiteshew Felisa
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