Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2011-07-12
2011-07-12
Landau, Matthew C (Department: 2813)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257SE29069
Reexamination Certificate
active
07977664
ABSTRACT:
Growing a first nitride semiconductor layer on an AlxGayIn1-x-yN(0≦x≦1, 0<y≦1, 0<x+y≦1)layer, reducing the thickness of the first nitride semiconductor layer by growth interruption and, growing a second nitride semiconductor layer having a band gap energy higher than that of the first nitride semiconductor layer on the first nitride semiconductor layer with the reduced thickness and a light emitting device using the growth method.
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Kwon, Soon-Young, Effect of Growth Interruption on In-rich InGa/GaN single quantum well structure, Oct. 20, 2003, pp. 2831-2833, Wiley-VCH.
M.G. Cheong et al., “Effects of growth interruption on the optical and the structural properties on InGaN/GaN quantum wells grown by metalorganic chemical vapor deposition”, Journal of Applied physics, Dec. 1, 2001, vol. 90, No. 11, pp. 5642-5646.
Kwon Soon-Yong
Moon Pilkyung
Yoon Euijoon
Crawford Latanya
Husch & Blackwell LLP
Landau Matthew C
Seoul National University Industry Foundation
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