Group of at least two gas-flow reactors supplied with...

Details Group of at least two gas-flow reactors supplied with... Group of at least two gas-flow reactors supplied with...

2006-02-23

2010-06-08

Vanoy, Timothy C (Department: 1793)

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

C423S24000R, C423S24000R, C423S245100, C422S168000, C422S169000, C422S170000, C422S171000, C422S172000, C422S177000

Reexamination Certificate

active

07731924

ABSTRACT:
A group of at least two gas-flow reactors (21, 22, 2′2, . . . , 2n, 2′n) preferably with an ascending gas flow (3), are supplied in parallel with gas and with a chemical neutralization and/or sorption agent of the pulverulent material type capable of adsorbing effluents present in the gas flow by bringing the chemical neutralization and/or sorption agent in contact with the gas flow, the at least two reactors having elements (10) for collecting the chemical neutralization and/or sorption agent after contact with the gas flow. At least one of the two reactors has elements (11) for discharging the chemical neutralization and/or or sorption agent, after contact with the gas flow, these discharge elements being connected to the collecting elements, and members (7, 16) for injecting the chemical neutralization and/or sorption agent into at least one other of the at least two reactors.

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patent: 96/15846 (1996-05-01), None
patent: 97/12659 (1997-04-01), None

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