Group III-V nitride-based semiconductor substrate and group...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular dopant concentration or concentration profile

Reexamination Certificate

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C257S609000, C257S610000, C257S611000

Reexamination Certificate

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07847313

ABSTRACT:
A group III-V nitride-based semiconductor substrate is formed of a group III-V nitride-based semiconductor single crystal containing an n-type impurity. The single crystal has a periodical change in concentration of the n-type impurity in a thickness direction of the substrate. The periodical change has a minimum value in concentration of the n-type impurity not less than 5×1017cm−3at an arbitrary point in plane of the substrate.

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“Periodic.” Def. 2. Webster's II New Riverside University Dictionary. 1994.
Yuichi Oshima et al, Preparation of Freestanding Gan Wafers by Hydride Vapor Phase Epitaxy with Void-Assisted Separation, Japanese J. Application Phys. vol. 42 (2003) pp. L1-L3, dated Jan. 15, 2003.

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