Etching a substrate: processes – Forming or treating an article whose final configuration has...
Reexamination Certificate
2008-12-01
2011-12-06
Norton, Nadine G (Department: 1713)
Etching a substrate: processes
Forming or treating an article whose final configuration has...
C216S083000, C438S745000
Reexamination Certificate
active
08070966
ABSTRACT:
A fabrication method produces a mechanically patterned layer of group III-nitride. The method includes providing a crystalline substrate and forming a first layer of a first group III-nitride on a planar surface of the substrate. The first layer has a single polarity and also has a pattern of holes or trenches that expose a portion of the substrate. The method includes then, epitaxially growing a second layer of a second group III-nitride over the first layer and the exposed portion of substrate. The first and second group III-nitrides have different alloy compositions. The method also includes subjecting the second layer to an aqueous solution of base to mechanically pattern the second layer.
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Chowdhury Aref
Ng Hock
Slusher Richart Elliott
Alcatel Lucent
Lin Patti
McCabe John F.
Norton Nadine G
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