Group III-nitride growth on silicon or silicon germanium...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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C257SE33049, C372S050110

Reexamination Certificate

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07928471

ABSTRACT:
A structure including a Si1-xGexsubstrate and a distributed Bragg reflector layer disposed directly onto the substrate. The distributed Bragg reflector layer includes a repeating pattern that includes at least one aluminum nitride layer and a second layer having the general formula AlyGa1-yN. Another aspect of the present invention is various devices including this structure. Another aspect of the present invention is directed to a method of forming such a structure comprising providing a Si1-xGexsubstrate and depositing a distributed Bragg reflector layer directly onto the substrate. Another aspect of the present invention is directed to a photodetector or photovoltaic cell device, including a Si1-xGexsubstrate device, a group III-nitride device and contacts to provide a conductive path for a current generated across at least one of the Si1-xGexsubstrate device and the group III-nitride device upon incident light.

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