Group III nitride field effect transistors (FETS) capable of...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S192000

Reexamination Certificate

active

07465967

ABSTRACT:
Group III Nitride based field effect transistor (FETS) are provided having a power degradation of less than about 3.0 dB when operated at a drain-to-source voltage (VDS) of about 56 volts, a gate to source voltage (Vgs) of from about −8 to about −14 volts and a temperature of about 140° C. for at least about 10 hours.

REFERENCES:
patent: 4424525 (1984-01-01), Mimura
patent: 4471366 (1984-09-01), Delagebeaudeuf et al.
patent: 4727403 (1988-02-01), Hilda et al.
patent: 4755867 (1988-07-01), Cheng
patent: 4788156 (1988-11-01), Stoneham et al.
patent: 4946547 (1990-08-01), Palmour et al.
patent: 5053348 (1991-10-01), Mishra et al.
patent: 5172197 (1992-12-01), Nguyen et al.
patent: 5192987 (1993-03-01), Khan et al.
patent: 5200022 (1993-04-01), Kong et al.
patent: 5210051 (1993-05-01), Carter, Jr.
patent: 5296395 (1994-03-01), Khan et al.
patent: 5298445 (1994-03-01), Asano
patent: RE34861 (1995-02-01), Davis et al.
patent: 5389571 (1995-02-01), Takeuchi et al.
patent: 5393993 (1995-02-01), Edmond et al.
patent: 5523589 (1996-06-01), Edmond et al.
patent: 5534462 (1996-07-01), Fiordalice et al.
patent: 5592501 (1997-01-01), Edmond et al.
patent: 5686737 (1997-11-01), Allen
patent: 5700714 (1997-12-01), Ogilhara et al.
patent: 5701019 (1997-12-01), Matsumoto et al.
patent: 5705827 (1998-01-01), Baba et al.
patent: 5804482 (1998-09-01), Konstantinov et al.
patent: 5885860 (1999-03-01), Weitzel et al.
patent: 5946547 (1999-08-01), Kim et al.
patent: 5990531 (1999-11-01), Taskar et al.
patent: 6028328 (2000-02-01), Riechert et al.
patent: 6046464 (2000-04-01), Schetzina
patent: 6051849 (2000-04-01), Davis et al.
patent: 6064082 (2000-05-01), Kawai et al.
patent: 6086673 (2000-07-01), Molnar
patent: 6150680 (2000-11-01), Eastman et al.
patent: 6177685 (2001-01-01), Teraguchi et al.
patent: 6177688 (2001-01-01), Linthicum et al.
patent: 6218680 (2001-04-01), Carter, Jr. et al.
patent: 6255198 (2001-07-01), Linthicum et al.
patent: 6261929 (2001-07-01), Gehrke et al.
patent: 6316793 (2001-11-01), Sheppard et al.
patent: 6376339 (2002-04-01), Linthicum et al.
patent: 6380108 (2002-04-01), Linthicum et al.
patent: 6429467 (2002-08-01), Ando
patent: 6448648 (2002-09-01), Boos
patent: 6462355 (2002-10-01), Linthicum et al.
patent: 6486042 (2002-11-01), Gehrke et al.
patent: 6489221 (2002-12-01), Gehrke et al.
patent: 6492669 (2002-12-01), Nakayama et al.
patent: 6515316 (2003-02-01), Wojtowicz et al.
patent: 6521514 (2003-02-01), Gehrke et al.
patent: 6545300 (2003-04-01), Gehrke et al.
patent: 6548333 (2003-04-01), Smith
patent: 6570192 (2003-05-01), Davis et al.
patent: 6582906 (2003-06-01), Cao et al.
patent: 6582986 (2003-06-01), Kong et al.
patent: 6586778 (2003-07-01), Linthicum et al.
patent: 6586781 (2003-07-01), Wu et al.
patent: 6602763 (2003-08-01), Davis et al.
patent: 6602764 (2003-08-01), Linthicum et al.
patent: 6608327 (2003-08-01), Davis et al.
patent: 6621148 (2003-09-01), Linthicum et al.
patent: 6639255 (2003-10-01), Inoue et al.
patent: 6686261 (2004-02-01), Gehrke et al.
patent: 6706114 (2004-03-01), Mueller
patent: 6841001 (2005-01-01), Saxler
patent: 6849882 (2005-02-01), Chavarkar et al.
patent: 2001/0015446 (2001-08-01), Inoue et al.
patent: 2001/0020700 (2001-09-01), Inoue et al.
patent: 2001/0023964 (2001-09-01), Wu et al.
patent: 2001/0040246 (2001-11-01), Ishii
patent: 2002/0008241 (2002-01-01), Edmond et al.
patent: 2002/0017696 (2002-02-01), Nakayama et al.
patent: 2002/0066908 (2002-06-01), Smith
patent: 2002/0079508 (2002-06-01), Yoshida
patent: 2002/0119610 (2002-08-01), Nishii et al.
patent: 2002/0167023 (2002-11-01), Charvarkar et al.
patent: 2003/0017683 (2003-01-01), Emrick et al.
patent: 2003/0020092 (2003-01-01), Parikh et al.
patent: 2003/0102482 (2003-06-01), Saxler
patent: 2003/0123829 (2003-07-01), Taylor
patent: 2003/0145784 (2003-08-01), Thompson et al.
patent: 2003/0157776 (2003-08-01), Smith
patent: 2003/0213975 (2003-11-01), Hirose et al.
patent: 2004/0004223 (2004-01-01), Nagahama et al.
patent: 2004/0021152 (2004-02-01), Nguyen et al.
patent: 2004/0029330 (2004-02-01), Hussain et al.
patent: 2004/0061129 (2004-04-01), Saxler et al.
patent: 2004/0124435 (2004-07-01), D'Evelyn et al.
patent: 2004/0241970 (2004-12-01), Ring
patent: 0 334 006 (1989-09-01), None
patent: 0 563 847 (1993-10-01), None
patent: 10-050982 (1998-02-01), None
patent: 11261053 (1999-09-01), None
patent: 2001230407 (2001-08-01), None
patent: 2002016087 (2002-01-01), None
patent: 2004-342810 (2004-12-01), None
patent: WO 93/23877 (1993-11-01), None
patent: WO 01/57929 (2001-08-01), None
patent: WO 03/049193 (2003-06-01), None
patent: WO 2004/008495 (2004-01-01), None
International Search Report and the Written Opinion, dated Oct. 6, 2006 for corresponding PCT application No. PCT/US2006/003259.
Kunii T et al.,A high reliability GaN HEMT with SiN passivation by cat-CVD, Compound Semiconductor Integrated Circuit Symposium, 2004, 2004 IEEE CSIC Digest, pp. 197-200.
Hansen P et al.,AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors using barium strontium titanate, J. Vac. Sci. Technol. B 22(5), Sep./Oct. 2004, pp. 2479-2485.
Ambacher et al., “Two Dimensional Electron Gases Induced by Spontaneous and Piezoelectric Polarization Charges in N- and Ga-face AlGaN/GaN Heterostructures,”Journal of Applied Physics. vol. 85, No. 6, pp. 3222-3233 (Mar. 1999).
Ando et al., “10-W/mm AlGaN-GaN HFET With a Field Modulating Plate,”IEEE Electron Device Letters, 24(5), pp. 289-291 (May 2003).
Asbeck et al. “Piezoelectric charge densities in AlGaN/GaN HFETs,”Elecronics Letters. vol. 33, No. 14, pp. 1230-1231 (1997).
Beaumont, B. et al., “Epitaxial Lateral Overgrowth of GaN,”Phys. Stat. Sol. (b) 227, No. 1, pp. 1-43 (2001).
Ben-Yaacov et al., “AlGaN/GaN Current Aperture Vertical Electron Transistors with Regrown Channels,”Journal of Applied Physics. vol. 95, No. 4, pp. 2073-2078 (2004).
Breitschadel et al. “Minimization of Leakage Current of Recessed Gate AlGaN/GaN HEMTs by Optimizing the Dry-Etching Process,”Journal of Electronic Materials. vol. 28, No. 12, pp. 1420-1423 (1999).
Burm et al. “Recessed Gate GaN MODFETS,”Solid-State Electronics. vol. 41, No. 2, pp. 247-250 (1997).
Burm et al. “Ultra-Low Resistive Ohmic Contacts onn-GaN Using Si Implantation,”Applied Physics Letters. vol. 70, No. 4, 464-66 (1997).
Chang et al., “AlGaN/GaN Modulation-Doped Field-Effect Transistors with an Mg-doped Carrier Confinement Layer,”Jpn. J. Appl. Phys., 42:3316-3319 (2003).
Chen et al. “C12 reactive ion etching for gate recessing of AlGaN/GaN field-effect transistors,”J. Vac. Sci. Technol. B. vol. 17, No. 6, pp. 2755-2758 (1999).
Chini et al., “Power and Linearity Characteristics of Field-Plagted Recessed-Gate AlGaN-GaN HEMTs,”IEEE Electron Device Letters, 25(5), pp. 229-231 (May 2004).
Cho et al., “A New GaAs Field Effect Transistor (FET) with Dipole Barrier (DIB),”Jpn. J. Appl. Phys. 33:775-778 (1994).
Coffie et al., Unpassivated p-GaN/AlGaN/GaN HEMTs with 7.1 W/MMF at 10 GHz,Electronic Letters onlineNo. 20030872, 39(19), (Sep. 18, 2003).
Eastman et al. “GaN materials for high power microwave amplifiers,”Mat. Res. Soc. Symp. Proc. vol. 512 (1998).
Eastman et al. “Undoped AlGaN/GaN HEMTs for Microwave Power Amplification,”IEEE Transactions on Electron Devices. vol. 48, No. 3, pp. 479-485 (Mar. 2001).
Egawa et al. “Recessed gate ALGaN/GaN MODFET on Sapphire Grown by MOCVD,”Applied Physics Letters. vol. 76, No. 1, pp. 121-123 (Jan. 2000).
Gaska et al. “Electron Transport in AlGaN/GaN Heterostructures Grown on 6H-SiC Substrates,”Applied Physics Letters. vol. 72, No. 6, pp. 707-709 (Feb. 1998).
Gaska et al. “High-Temperature Performance of AlGaN/GaN HFET's on SiC Substrates,”IEEE Electron Device Letters. vol. 18, No. 1, pp. 492-494 (Oct. 1997).
Gaska et al., “Self-Heating in High-Power AlGaN/GaN HFET's,”IEEE Electron Dev

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Group III nitride field effect transistors (FETS) capable of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Group III nitride field effect transistors (FETS) capable of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Group III nitride field effect transistors (FETS) capable of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4025251

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.