Group III nitride compound semiconductor device having a...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular semiconductor material

Reexamination Certificate

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C257S615000, C257SE33028

Reexamination Certificate

active

07015515

ABSTRACT:
After one of layers constituting a superlattice structure is formed by an MOCVD method, NH3gas is circulated together with H2gas as a carrier gas to thereby perform a purge step. After the purge step, a next layer is formed.

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T. Kachi, “Manufacturing Method of Group-III Nitride Semiconductor, Manufacturing Method of Group-III Nitride Semiconductor Luminous Element, and Group-III Nitride Semiconductor Luminous Element,” Translation of JP2001-97800-A, Apr. 2001, JPO, 31 pages.
K. Kumakura et al., “Increased Electrical Activity of Mg-Acceptors in Alx Gai-x N/GaN Superlattices,” Jpn. J. Appl. Phys., vol. 38, Part 2, No. 9A/B, Sep. 1999, pp. L1012-L1014.

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